"Magnetron Sputtering Apparatus and Method for Depositing a Coating Using Same"
Patent No.:	7,520,965
Inventor(s):	Ronghua Wei
Date of Issue:	4/21/2009
Assignee:	SwRI
Full Text:	US Patent & Trademark Office

Click on the inventor's name to view related technical resources:
Ronghua Wei:	Program Director, Materials Engineering, Mechanical Engineering

For further information, contact the Communications Department, Southwest Research Institute.

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