"Method for Magnetron Sputter Deposition"
Patent No.:	7,790,003
Inventor(s):	Kuang-Tsan K. Chiang, Ronghua Wei, Edward Langa
Date of Issue:	9/7/2010
Assignee:	SwRI
Full Text:	US Patent & Trademark Office

Click on the inventor's name to view related technical resources:
Kuang-Tsan K. Chiang:	Senior Research Scientist, Geosciences & Engineering
Ronghua Wei:	Program Director, Materials Engineering, Mechanical Engineering

For further information, contact the Communications Department, Southwest Research Institute.

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