Abstract:
A method of depositing a coating by vapor deposition. The method including ionizing a process gas, generating a metal vapor and creating a metal flow having a metal atom flow density in the range of 1E14 m.sup.-3 to 1E24 m.sup.-3. The method also includes providing a thermionic emission from a thermionic ionizing grid including thermionic filaments, wherein said ionizing filament grid is at least partially located within said region having a metal atom flow density in the range of 1E14 m.sup.-3 to 1E24 m.sup.-3, and coating a substrate with the metal vapor.
Patent Number:
8,895,115
Date Of Issue:
11/24/2014
Inventors:
Vladimir Gorokhovsky
Full Text: