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Polysilazane Precursors for Silicon Nitride and Resultant Products

Abstract: 

A method of making a polysilazane comprising forming a reaction medium comprising at least one halomonosilane, an ammonium compound, and an organic solvent for said at least one halomonosilane, carrying out the reaction between said at least one halomonosilane and said ammonium compound in the absence of any catalyst, oxygen, and moisture at atmospheric pressure and at a temperature of about -80.degree. C. to 50.degree. C. for a time sufficient to form said polysilazane, and separating said polysilazane from said reaction medium.

Patent Number: 
5,294,425
Date Of Issue: 
03/15/1994
Inventors: 

Stuart T. Schwab