Advanced science.  Applied technology.


Physical Vapor Deposition (PVD)

Physical vapor deposition (PVD) defines a class of vacuum-based deposition techniques that deposit coatings and thin films onto the surface of a part by evaporating or sputtering a solid source material. Southwest Research Institute provides research and development services to advance physical vapor deposition technologies, including:

  • Magnetron Sputtering
  • Plasma Enhanced Magnetron Sputtering (PEMS)
  • High Power Impulse Magnetron Sputtering (HiPIMS)
  • Cylindrical Magnetron Sputtering
  • Reactive Magnetron Sputtering
  • Electron Beam Evaporation
  • Roll to Roll Thermal Evaporation
  • Ion Beam Assisted Deposition

PVD Deposition & Coating Services

Scientist working in materials science laboratory containing vacuum chambers

SwRI’s materials science laboratory offers 20 vacuum chambers for depositing thin films on solid surfaces.

PVD coatings can be deposited onto a variety of materials using several methodologies. SwRI provides PVD deposition and coating services for several industries using the following methods and applications, among others:

  • Diamond Like Carbon (DLC)
  • Titanium Silicon Carbon Nitride Nanocomposite (TiSiCN)
  • Titan-X Coating Series 3100, 4100, 5100
  • Titanium Nitride (TiN)
  • Chromium Nitride (CrN)
  • Aluminum Chromium Nitride (AlCrN / CrAlN)
  • Tantalum (Ta)
  • Hastelloy C-276
  • Yttrium Stabilized Zirconia (YSZ)
  • Zirconium Nitride (ZrN)
  • Oxide film
  • Titanium oxide (TiO2)
  • Optical Coatings & Thin films
  • Dichroic thin films
  • Anti-reflective coatings
  • Moth-eye coatings
  • Flexible thin films
  • Roll to roll coatings

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