Advanced science.  Applied technology.


Physical Vapor Deposition (PVD)

Physical vapor deposition (PVD) defines a class of vacuum-based deposition techniques that deposit coatings and thin films onto the surface of a part by evaporating or sputtering a solid source material. Southwest Research Institute provides research and development services to advance physical vapor deposition technologies, including:

  • Magnetron Sputtering
  • Plasma Enhanced Magnetron Sputtering (PEMS)
  • High Power Impulse Magnetron Sputtering (HiPIMS)
  • Cylindrical Magnetron Sputtering
  • Reactive Magnetron Sputtering
  • Electron Beam Evaporation
  • Roll to Roll Thermal Evaporation
  • Ion Beam Assisted Deposition

PVD Deposition & Coating Services

SwRI’s materials science laboratory offers 20 vacuum chambers for depositing thin films on solid surfaces.

PVD coatings can be deposited onto a variety of materials using several methodologies. SwRI provides PVD deposition and coating services for several industries using the following methods and applications, among others:

  • Diamond Like Carbon (DLC)
  • Titanium Silicon Carbon Nitride Nanocomposite (TiSiCN)
  • Titan-X Coating Series 3100, 4100, 5100
  • Titanium Nitride (TiN)
  • Chromium Nitride (CrN)
  • Aluminum Chromium Nitride (AlCrN / CrAlN)
  • Tantalum (Ta)
  • Hastelloy C-276
  • Yttrium Stabilized Zirconia (YSZ)
  • Zirconium Nitride (ZrN)
  • Oxide film
  • Titanium oxide (TiO2)
  • Optical Coatings & Thin films
  • Dichroic thin films
  • Anti-reflective coatings
  • Moth-eye coatings
  • Flexible thin films
  • Roll to roll coatings

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