Apparatus and Method Utilizing a Double Glow Discharge Plasma for Sputter Cleaning

Abstract

The present disclosure relates to an apparatus and method utilizing double glow discharge for sputter cleaning of a selected surface. The surface may include the inner surface of a hollow substrate such as a tube which inner surface may then be coated via magnetron sputter deposition.

Patent Number
8,747,631
Date Of Issue
Inventors

Ronghua Wei; Edward Langa; Sabrina L. Lee