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Plasma Immersion Ion Processing for Coating of Hollow Substrates

Abstract: 

The present disclosure relates to a method for plasma ion deposition and coating formation. A vacuum chamber may be supplied, wherein the vacuum chamber is formed by a hollow substrate having a length, diameter and interior surface. A plasma may be formed within the chamber while applying a negative bias to the hollow substrate to draw ions from the plasma to the interior surface of the hollow substrate to deposit ions onto the interior surface and forming a coating. The coating may have a Vickers Hardness Number (Hv) of at least 500.

Patent Number: 
8,029,875
Date Of Issue: 
10/04/2011
Inventors: 

Ronghua Wei; Christopher Rincon; James H. Arps